ABADLI, S; MANSOUR, F. AN ADVANCED MODEL FOR DOPANT DIFFUSION IN HEAVILY IMPLANTED POLYCRYSTALLINE SILICON THIN FILMS. Sciences & Technologie. B, Sciences de l’ingénieur, [S. l.], n. 26, p. 23–30, 2007. Disponível em: https://revue.umc.edu.dz/b/article/view/228. Acesso em: 3 mai. 2024.